Computation Pushes Light Beyond the Mask

Diffraction prevents a drawn mask shape from printing directly at advanced geometries. Optical proximity correction and inverse-lithography techniques calculate patterns that produce the intended wafer feature after optics, resist, etch, and process variation act.

Those calculations demand immense optimization and simulation. GPU systems manufactured by the same foundries then accelerate the next mask-generation cycle.

Open the Loop to More Builders

Confidential process models, proprietary EDA, foundry rules, scanner knowledge, and closed hardware reinforce the cycle. OpenLane, open PDK efforts, SkyWater, RISC-V, and open hardware create entry points at accessible nodes.

Foundries, universities, EDA teams, equipment builders, and governments can widen those entry points. Open more of the manufacturing stack and let new chip creators improve the cycle.

Build the Fabrication Path Behind The Closed Photolithography Compute Cycle

The Missing Maker Fab carries this work into the tools and processes required to fabricate fast active devices locally.

The Missing Maker Fab · https://youtube.com/watch?v=rdlZ8KYVtPU&si=5vFNyqV8kS1q86b2